发明授权
US07097779B2 Processing system and method for chemically treating a TERA layer
有权
用于化学处理TERA层的处理系统和方法
- 专利标题: Processing system and method for chemically treating a TERA layer
- 专利标题(中): 用于化学处理TERA层的处理系统和方法
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申请号: US10883784申请日: 2004-07-06
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公开(公告)号: US07097779B2公开(公告)日: 2006-08-29
- 发明人: Aelan Mosden , Asao Yamashita
- 申请人: Aelan Mosden , Asao Yamashita
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; H01L21/00
摘要:
A processing system and method for chemically treating a TERA layer on a substrate. The chemical treatment of the substrate chemically alters exposed surfaces on the substrate. In one embodiment, the system for processing a TERA layer includes a plasma-enhanced chemical vapor deposition (PECVD) system for depositing the TERA layer on the substrate, an etching system for creating features in the TERA layer, and a processing subsystem for reducing the size of the features in the TERA layer.