发明授权
US07101492B2 Fluorinated surfactants for aqueous acid etch solutions 有权
氟化表面活性剂用于酸性蚀刻溶液

Fluorinated surfactants for aqueous acid etch solutions
摘要:
Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
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