Invention Grant
US07102737B2 Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light
失效
使用过滤的荧光,反射或吸收光进行自动化,原位材料检测的方法和装置
- Patent Title: Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light
- Patent Title (中): 使用过滤的荧光,反射或吸收光进行自动化,原位材料检测的方法和装置
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Application No.: US10861738Application Date: 2004-06-04
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Publication No.: US07102737B2Publication Date: 2006-09-05
- Inventor: Mark Eyolfson , Elton J. Hochhalter , Joe Lee Phillips , David R. Johnson , Peter S. Frank
- Applicant: Mark Eyolfson , Elton J. Hochhalter , Joe Lee Phillips , David R. Johnson , Peter S. Frank
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt, PC
- Main IPC: G01N21/64
- IPC: G01N21/64 ; G01N21/88

Abstract:
A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface are disclosed. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit, which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.
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