发明授权
US07102737B2 Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light
失效
使用过滤的荧光,反射或吸收光进行自动化,原位材料检测的方法和装置
- 专利标题: Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light
- 专利标题(中): 使用过滤的荧光,反射或吸收光进行自动化,原位材料检测的方法和装置
-
申请号: US10861738申请日: 2004-06-04
-
公开(公告)号: US07102737B2公开(公告)日: 2006-09-05
- 发明人: Mark Eyolfson , Elton J. Hochhalter , Joe Lee Phillips , David R. Johnson , Peter S. Frank
- 申请人: Mark Eyolfson , Elton J. Hochhalter , Joe Lee Phillips , David R. Johnson , Peter S. Frank
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: TraskBritt, PC
- 主分类号: G01N21/64
- IPC分类号: G01N21/64 ; G01N21/88
摘要:
A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface are disclosed. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit, which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.
公开/授权文献
信息查询