- 专利标题: Photolithographic techniques for producing angled lines
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申请号: US10928771申请日: 2004-08-27
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公开(公告)号: US07105841B2公开(公告)日: 2006-09-12
- 发明人: Paul A. Farrar
- 申请人: Paul A. Farrar
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Schwegman, Lundberg, Woessner & Kluth, P.A.
- 主分类号: H01J37/302
- IPC分类号: H01J37/302
摘要:
The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be formed efficiently. One aspect of the present subject matter relates to a method for forming non-orthogonal images in a raster-based photolithographic system. According to various embodiments of the method, a first image corresponding to a first data set is formed on a reticle when the reticle is at a first rotational position θ1. The reticle is adjusted to a second rotational position θ2. A second image corresponding to a second data set is formed on the reticle when the reticle is at the second rotational position θ2. The second image is non-orthogonal with respect to the first image. Other aspects are provided herein.
公开/授权文献
- US20050030516A1 Photolithographic techniques for producing angled lines 公开/授权日:2005-02-10
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