发明授权
- 专利标题： Methods and systems for determining a presence of defects and a thin film characteristic of a specimen
- 专利标题（中）： 用于确定缺陷的存在和样品的薄膜特性的方法和系统
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申请号： US09956845申请日： 2001-09-20
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公开(公告)号： US07106425B1公开(公告)日： 2006-09-12
- 发明人: Gary Bultman , Ady Levy , Kyle A. Brown , Mehrdad Nikoonahad , Dan Wack , John Fielden
- 申请人： Gary Bultman , Ady Levy , Kyle A. Brown , Mehrdad Nikoonahad , Dan Wack , John Fielden
- 申请人地址： US CA Milpitas
- 专利权人： KLA-Tencor Technologies Corp.
- 当前专利权人： KLA-Tencor Technologies Corp.
- 当前专利权人地址： US CA Milpitas
- 代理机构： Daffer McDaniel, LLP
- 代理商 Ann Marie Mewherter
- 主分类号： G01N21/88
- IPC分类号： G01N21/88
摘要：
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of defects on the specimen and a thin film characteristic of the specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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