发明授权
- 专利标题: CD metrology analysis using a finite difference method
- 专利标题(中): CD测量分析使用有限差分法
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申请号: US11150003申请日: 2005-06-10
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公开(公告)号: US07106459B2公开(公告)日: 2006-09-12
- 发明人: Hanyou Chu
- 申请人: Hanyou Chu
- 申请人地址: US CA Fremont
- 专利权人: Therma-Wave, Inc.
- 当前专利权人: Therma-Wave, Inc.
- 当前专利权人地址: US CA Fremont
- 代理机构: Stallman & Pollock LLP
- 主分类号: G01B11/00
- IPC分类号: G01B11/00
摘要:
A method for modeling diffraction includes constructing a theoretical model of the subject. A numerical method is then used to predict the output field that is created when an incident field is diffracted by the subject. The numerical method begins by computing the output field at the upper boundary of the substrate and then iterates upward through each of the subject's layers. Structurally simple layers are evaluated directly. More complex layers are discretized into slices. A finite difference scheme is performed for these layers using a recursive expansion of the field-current ratio that starts (or has a base case) at the lowermost slice. The combined evaluation, through all layers, creates a scattering matrix that is evaluated to determine the output field for the subject.
公开/授权文献
- US20050231737A1 CD metrology analysis using a finite difference method 公开/授权日:2005-10-20
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