Invention Grant
US07107998B2 Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus
有权
在CVD装置中防止和清洁含钌沉积物的方法
- Patent Title: Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus
- Patent Title (中): 在CVD装置中防止和清洁含钌沉积物的方法
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Application No.: US10687318Application Date: 2003-10-16
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Publication No.: US07107998B2Publication Date: 2006-09-19
- Inventor: Harold F. R. Greer , James A. Fair , Junghwan Sung , Nerissa Sue Draeger
- Applicant: Harold F. R. Greer , James A. Fair , Junghwan Sung , Nerissa Sue Draeger
- Applicant Address: US CA San Jose
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agent Thomas Swenson
- Main IPC: B08B9/00
- IPC: B08B9/00 ; C23F4/00
Abstract:
Carbon monoxide gas is provided in a ruthenium-deposition apparatus to clean undesired ruthenium-containing deposits from apparatus surfaces. Carbon monoxide gas is mixed with reactant gases in apparatus tubing and in a ruthenium-deposition reaction chamber to inhibit formation of undesired ruthenium deposits on apparatus surfaces and to remove ruthenium deposits.
Public/Granted literature
- US20050081882A1 Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus Public/Granted day:2005-04-21
Information query
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