发明授权
- 专利标题: Thin-film bulk acoustic oscillator and method of manufacturing same
- 专利标题(中): 薄膜体声波振荡器及其制造方法
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申请号: US10814120申请日: 2004-04-01
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公开(公告)号: US07109637B2公开(公告)日: 2006-09-19
- 发明人: Eiju Komuro , Hisatoshi Saitou , Yoshinari Yamashita
- 申请人: Eiju Komuro , Hisatoshi Saitou , Yoshinari Yamashita
- 申请人地址: JP Tokyo
- 专利权人: TDK Corporation
- 当前专利权人: TDK Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2003-194530 20030709
- 主分类号: H01L41/04
- IPC分类号: H01L41/04 ; H03H9/15
摘要:
A thin-film bulk acoustic oscillator comprises: a base; a barrier layer disposed on the base; a lower electrode disposed on the barrier layer; a piezoelectric thin film disposed on the lower electrode; and an upper electrode disposed on the piezoelectric thin film. The piezoelectric thin film includes a columnar crystal that extends in the direction intersecting the film surface. The top surface of the piezoelectric thin film is flattened by polishing so as to have a root mean square roughness of 2 nm or smaller.
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