Invention Grant
- Patent Title: Method and apparatus for inspecting a substrate
- Patent Title (中): 用于检查基板的方法和装置
-
Application No.: US10777922Application Date: 2004-02-11
-
Publication No.: US07113274B2Publication Date: 2006-09-26
- Inventor: Yu-Sin Yang , Sang-Mun Chon , Sun-Yong Choi , Chung-Sam Jun
- Applicant: Yu-Sin Yang , Sang-Mun Chon , Sun-Yong Choi , Chung-Sam Jun
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Marger Johnson & McCollm, P.C.
- Priority: KR10-2003-0012824 20030228
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
In a method and an apparatus for inspecting defects on a substrate using a light beam, a light source irradiates light beams having different wavelengths onto the substrate. A detector detects first lights scattered from a surface of the substrate and second lights scattered from impurities on the substrate by irradiation of the light beams. An operation unit compares first intensities of the first lights with second intensities of the second lights in order to produce differential values therebetween, and selects a wavelength corresponding to a maximum value of the differential values. An inspection process for inspecting the defects on the substrate is performed using a light beam having the selected wavelength.
Public/Granted literature
- US20040169851A1 Method and apparatus for inspecting a substrate Public/Granted day:2004-09-02
Information query