发明授权
- 专利标题： Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
- 专利标题（中）： 用于清洁光刻投影装置的部件的表面的方法，光刻投影装置，装置制造方法和清洁系统
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申请号： US10738976申请日： 2003-12-19
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公开(公告)号： US07116394B2公开(公告)日： 2006-10-03
- 发明人: Levinus Pieter Bakker , Ralph Kurt , Bastiaan Matthias Mertens , Markus Weiss , Johann Trenkler , Wolfgang Singer
- 申请人： Levinus Pieter Bakker , Ralph Kurt , Bastiaan Matthias Mertens , Markus Weiss , Johann Trenkler , Wolfgang Singer
- 申请人地址： NL Veldhoven DE Oberkochen
- 专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人地址： NL Veldhoven DE Oberkochen
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： DE10261875 20021220; EP02080488 20021224
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.
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