发明授权
- 专利标题: Photothermographic materials with UV absorbing compounds
- 专利标题(中): 光热成像材料与紫外线吸收化合物
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申请号: US10896108申请日: 2004-07-21
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公开(公告)号: US07118849B2公开(公告)日: 2006-10-10
- 发明人: Robert E. Dickerson , Kurt M. Schroeder
- 申请人: Robert E. Dickerson , Kurt M. Schroeder
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 代理商 J. Lanny Tucker; Louis M. Leichter
- 主分类号: G03C5/16
- IPC分类号: G03C5/16 ; G03C1/825 ; G03C1/498
摘要:
Photothermographic materials are coated with imaging layers and an antihalation layer between the support and thermally developable imaging layers on one or both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby excited to form a latent image in the photothermographic material that can eventually be used for medical diagnosis. The antihalation layers contain radiation absorbing compounds (such as a UV-radiation absorbing compounds) that absorb radiation at the predetermined wavelength (for example at 300 to 450 nm) and have limited absorption at higher wavelengths.
公开/授权文献
- US20060019206A1 Photothermographic materials with UV absorbing compounds 公开/授权日:2006-01-26
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