发明授权
- 专利标题： Antimicrobial agent and production process thereof
- 专利标题（中）： 抗微生物剂及其制备方法
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申请号： US10739108申请日： 2003-12-19
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公开(公告)号： US07119151B2公开(公告)日： 2006-10-10
- 发明人: Haruo Watanabe , Yasuhito Inagaki , Tsutomu Noguchi
- 申请人： Haruo Watanabe , Yasuhito Inagaki , Tsutomu Noguchi
- 申请人地址： JP Tokyo
- 专利权人： Sony Corporation
- 当前专利权人： Sony Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Rader, Fishman & Grauer PLLC
- 代理商 Ronald P. Kananen
- 优先权： JPP2000-072514 20000310
- 主分类号： C08F8/42
- IPC分类号： C08F8/42
摘要：
An antimicrobial agent utilizes a resin having acrylonitrile and styrene and/or a conjugated diene as units. The antimicrobial agent includes a metal-salt-containing copolymer, and the metal-salt-containing copolymer is obtained by treating a copolymer containing acrylonitrile and at least one of styrene and a conjugated diene as units with an acid to thereby introduce acid radicals into the copolymer, and converting at least part of the acid radicals into a salt of at least one metal selected from among Ag, Cu, and Zn.
公开/授权文献
- US20060128864A1 Antimicrobial agent and production process thereof 公开/授权日：2006-06-15
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