Invention Grant
US07126972B2 Nitride based semiconductor laser diode device with a bar mask
有权
基于氮化物的半导体激光二极管器件带有条形掩模
- Patent Title: Nitride based semiconductor laser diode device with a bar mask
- Patent Title (中): 基于氮化物的半导体激光二极管器件带有条形掩模
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Application No.: US10250200Application Date: 2003-06-12
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Publication No.: US07126972B2Publication Date: 2006-10-24
- Inventor: Wen-How Lan , Yuh-Der Shiang , Jia-Ching Lin , Ker-Jun Lin , Kai-Fung Perng , Ya-Tung Cherng
- Applicant: Wen-How Lan , Yuh-Der Shiang , Jia-Ching Lin , Ker-Jun Lin , Kai-Fung Perng , Ya-Tung Cherng
- Applicant Address: TW Taoyuan
- Assignee: Chung-Shan Institute of Science and Technology
- Current Assignee: Chung-Shan Institute of Science and Technology
- Current Assignee Address: TW Taoyuan
- Agency: Jianq Chyun IP Office
- Priority: TW91121531A 20020920
- Main IPC: H01S3/04
- IPC: H01S3/04 ; H01S5/00 ; H01S3/20

Abstract:
A nitride based semiconductor laser diode device comprising a selective growth mask with a grating structure is proposed. The island-like stacked epitaxial layers including the P-type cladding layer is formed from the selective growth mask upon the active layer of the semiconductor laser structure. This proposed structure can reduce the strain by the deformation due to the isolate structure. Thus, increase of thickness of the cladding layer and/or increase of composition difference can be achieved without crack existing in the island-like stacked epitaxial layers. The optical confinement can be effectively improved.
Public/Granted literature
- US20040057481A1 [NITRIDE BASED SEMICONDUCTOR LASER DIODE DEVICE WITH A BAR MASK] Public/Granted day:2004-03-25
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