Invention Grant
- Patent Title: Substrates for in particular microlithography
- Patent Title (中): 特别是微光刻的基板
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Application No.: US10628059Application Date: 2003-07-25
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Publication No.: US07129010B2Publication Date: 2006-10-31
- Inventor: Jochen Alkemper , Lutz Aschke , Hrabanus Hack
- Applicant: Jochen Alkemper , Lutz Aschke , Hrabanus Hack
- Applicant Address: DE Mainz
- Assignee: Schott AG
- Current Assignee: Schott AG
- Current Assignee Address: DE Mainz
- Agent Michael J. Striker
- Priority: DE10235731 20020802
- Main IPC: G01F9/00
- IPC: G01F9/00 ; B32B17/06 ; B32B9/00
Abstract:
The present invention relates to a substrate in particular of EUV microlithography, to the production of a substrate of this type and to the use of this substrate as a substrate for mirrors and/or masks or mask blanks in particular in EUV microlithography.
Public/Granted literature
- US20040063004A1 Substrates for in particular microlithography Public/Granted day:2004-04-01
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