Abstract:
Side-emitting step index fibers. Between core and cladding, the side-emitting step index fibers have scattering centers that ensure the coupling out of light from the fiber. The side-emitting step index fibers are produced by preforms that contain inlay rods, in which the scattering centers are embedded and which are applied to the outer region of the fiber core during fiber drawing. Alternatively, at least one inlay tube can be used.
Abstract:
The scintillation material has a maximum oxygen content of 2,500 ppm and is a compound of formula LnX3 or LnX3:D, wherein Ln is at least one rare earth element, X is F, Cl, Br, or I; and D is at least one cationic dopant of one or more of the elements Y, Zr, Pd, Hf and Bi and, if present, is present in an amount of 10 ppm to 10,000 ppm. The process of making the scintillation material includes optionally mixing the compound of the formula LnX3 with the at least one cationic dopant, heating the compound or the mixture so obtained to a melting temperature to form a melt, adding one or more carbon halides and then cooling the melt to form a crystal or crystalline structure. The maximum oxygen content of the scintillation material is preferably 1000 ppm.
Abstract:
The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granet, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of Y3Al5O12, Lu3Al5O12, Ca3Al2Si3O12, K2NaAlF6, K2NaScF6, K2LiAlF6 and/or Na3Al2Li3F12, (Mg, Zn)Al2O4, CaAl2O4, CaB2O4 and/or LiAl5O8, BaZrO3 and/or CaCeO3. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.
Abstract:
The invention relates to an optical hybrid lens. According to the invention, the lens consists of a substrate (1) that consists of a ceramic having a predetermined shape and at least another material (2), which covers a surface of the substrate (1) at least in certain sections in order to form a lens surface. Use of an optical ceramic as a material enables an additional degree of freedom for adjusting the imaging properties of the hybrid lens. The optical ceramic may have a high refractive index and a low dispersion. The other material can be a material that can be deformed or recast at temperatures that are low in comparison to those of the optical ceramic. In particular the other material can be a low-TG glass or a polymer. The other material is directly applied onto the substrate without a further surface finishing being necessarily required. Other aspects of the invention relate to an optical lens group, an optical image acquisition device, and a process for manufacturing a hybrid lens.
Abstract:
The present invention relates to a substrate in particular of EUV microlithography, to the production of a substrate of this type and to the use of this substrate as a substrate for mirrors and/or masks or mask blanks in particular in EUV microlithography.
Abstract:
The process produces a scintillation material of formula LnX3 or LnX3:D, wherein Ln is at least one rare earth element, X is F, Cl, Br, or I; and D is at least one cationic dopant selected from the group consisting of Y, Zr, Pd, Hf and Bi. The at least one cationic dopant is present in the scintillation material in an amount of 10 ppm to 10,000 ppm. The process includes optionally mixing the compound of the general empirical formula LnX3 with the at least one cationic dopant, heating the compound or the mixture obtained by the optional mixing to a melting temperature thereof, then growing the crystal or crystalline structure and cooling the resulting crystal or crystalline structure from a growing temperature to a temperature of 100° C. at a cooling rate of less than 20 K/h.
Abstract:
The invention relates to a glass ceramic armour material consisting (in % by weight in relation to oxide base) of 5-33 SiO2, 20-50 Al2O3, 5-40 MgO, 0-15 B2O3, 0.1-30 Y2O3, Ln2O3, As2O3, Nb2O3 and/or Sc2O3 and 0-10 P2O5. The inventive armour material can also be reinforced with inorganic reinforcing fibres in a quantity of 5-65% by weight, preferably consisting of C, SiC, Si3N4, Al2O3, ZrO2 or Sialon. Said armour material is characterised in that it exhibits a high elasticity modulus and is producible from green glass without to fear a premature crystallisation.
Abstract translation:本发明涉及一种由5-33SiO 2,20-50 Al 2 O 3,5-40MgO,0-15B 2 O 3,0.1-30 Y 2 O 3,L 2 O 3,As 2 O 3组成(相对于氧化物基的重量%)的玻璃陶瓷装甲材料 ,Nb 2 O 3和/或Sc 2 O 3和0-10 P 2 O 5。 本发明的装甲材料还可以用5-65重量%的量的无机增强纤维来增强,优选由C,SiC,Si 3 N 4,Al 2 O 3,ZrO 2或赛隆组成。 所述装甲材料的特征在于其显示出高弹性模量并且可以从绿色玻璃制造而不用担心过早结晶。
Abstract:
A glass ceramic is specified, with a crystalline phase consisting predominantly of BPO4, and preferably exclusively of BPO4. The glass ceramic contains 10 to 50 wt.-% SiO2, 5 to 40 B2O3, 25 to 75 wt.-% P2O5, up to 5 wt.-% refining agents, up to 1 wt.-% impurities, and 0.1 to 10 wt.-% of at least one constituent selected from the group of M32O3, M52O5 and M4O2, wherein M3 is an element selected from the group of the lanthanoids, yttrium, iron, aluminum, gallium, indium and thallium; wherein M5 is an element selected from the group of vanadium, niobium and tantalum and wherein M4 is an element selected from the group of titanium, zirconium, hafnium and cerium. The glass ceramic is advantageously suitable for being coated with semiconductor materials.
Abstract translation:规定了玻璃陶瓷,其结晶相主要由BPO 4 N 3组成,优选仅为BPO 4。 玻璃陶瓷含有10至50重量%的SiO 2,5至40个B 2 O 3 3,25至75重量% P 2 O 5,最多5重量%的澄清剂,至多1重量%的杂质和0.1至10重量%的至少一种 选自M3 3 O 3,M 5 2 O 5和M 4 O 2的组分, 其中M3是选自镧系元素,钇,铁,铝,镓,铟和铊的元素; 其中M5是选自钒,铌和钽的元素,其中M4是选自钛,锆,铪和铈的元素。 玻璃陶瓷有利地适用于涂覆半导体材料。
Abstract:
The optical elements are made from an opto-ceramic material that is characterized by high density, transparency for visible light and IR, high refractive index, high Abbe number and outstanding relative partial dispersion. Mixed oxides are sintered to obtain the opto-ceramic material. The mixed oxides contain zirconium oxide and hafnium oxide mixed with one or more oxides of yttrium, scandium, lanthanide elements, and optionally mixed with one or more of SiO2, Na2O, and TiO2. Alternatively the mixed oxides contain zirconium oxide and hafnium oxide mixed with CaO and/or MgO and optionally mixed with one or more of SiO2, Na2O, and TiO2. In addition, the mixed oxides can also include one or more oxides of Al, Ga, In, and Sc; optionally one or more oxides of yttrium, some lanthanide elements; and optionally one or more of SiO2, Na2O, MgO, CaO, and TiO2.
Abstract:
The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved.