- 专利标题: Positive resist composition
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申请号: US10404671申请日: 2003-04-02
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公开(公告)号: US07129014B2公开(公告)日: 2006-10-31
- 发明人: Kouji Toishi , Yoshiko Miya , Yasunori Uetani
- 申请人: Kouji Toishi , Yoshiko Miya , Yasunori Uetani
- 申请人地址: JP Osaka
- 专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人地址: JP Osaka
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2002-101003 20020403
- 主分类号: G03C1/71
- IPC分类号: G03C1/71
摘要:
The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator, and multifunctional epoxy compound, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
公开/授权文献
- US20030236351A1 Positive resist composition 公开/授权日:2003-12-25
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