Invention Grant
- Patent Title: Apparatus for generating a plurality of beamlets
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Application No.: US10797364Application Date: 2004-03-10
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Publication No.: US07129502B2Publication Date: 2006-10-31
- Inventor: Pieter Kruit
- Applicant: Pieter Kruit
- Applicant Address: NL CJ Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL CJ Delft
- Agency: Blakely Sokoloff Taylor & Zafman
- Main IPC: H01J37/04
- IPC: H01J37/04

Abstract:
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.
Public/Granted literature
- US20040232349A1 Apparatus for generating a plurality of beamlets Public/Granted day:2004-11-25
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