发明授权
- 专利标题: Preparation of soft magnetic thin film
- 专利标题(中): 软磁薄膜的制备
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申请号: US10816834申请日: 2004-04-05
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公开(公告)号: US07135103B2公开(公告)日: 2006-11-14
- 发明人: Tetsuya Osaka , Tokihiko Yokoshima
- 申请人: Tetsuya Osaka , Tokihiko Yokoshima
- 申请人地址: JP Tokyo
- 专利权人: Waseda University
- 当前专利权人: Waseda University
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2003-358910 20031020
- 主分类号: C25D5/18
- IPC分类号: C25D5/18
摘要:
A soft magnetic thin film of CoFe alloy having a high Br and low Hc is prepared by furnishing a plating tank including cathode and anode compartments which are separated by a diaphragm or salt bridge so as to permit charge transfer, but inhibit penetration of Fe ions, feeding a plating solution containing Co ions and divalent Fe ions to the cathode compartment, feeding an electrolyte solution to the anode compartment, immersing a substrate in the plating solution, immersing an anode in the electrolyte solution, electroplating, and heat treating the plated film at 100–550° C.; or by immersing a substrate and a soluble anode in a plating solution containing Co ions and divalent Fe ions, electroplating, and heat treating the plated film at 100–550° C.
公开/授权文献
- US20050082171A1 Preparation of soft magnetic thin film 公开/授权日:2005-04-21
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