发明授权
- 专利标题: Method for thinning wafers that have contact bumps
- 专利标题(中): 稀释具有接触凸点的晶片的方法
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申请号: US10713659申请日: 2003-11-13
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公开(公告)号: US07135124B2公开(公告)日: 2006-11-14
- 发明人: Timothy C. Krywanczyk , Edmund J. Sprogis
- 申请人: Timothy C. Krywanczyk , Edmund J. Sprogis
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Bond Schoeneck & King PLLC
- 代理商 George R. McGuire
- 主分类号: H01L21/302
- IPC分类号: H01L21/302 ; C23F1/00 ; B24B1/00
摘要:
In accordance with the foregoing objects and advantages, the present invention provides a fabrication device that may be used during the grinding operation of the fabrication process. The fabrication device comprises a socket plate that includes a plurality of cavities formed therein that correspond in position and number to the solder (or other conductive material) bumps formed on the front surface of a product wafer.
公开/授权文献
- US20050106879A1 Method for thinning wafers that have contact bumps 公开/授权日:2005-05-19
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