发明授权
- 专利标题: Pattern-forming apparatus using a photomask
- 专利标题(中): 使用光掩模的图案形成装置
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申请号: US10630792申请日: 2003-07-31
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公开(公告)号: US07136145B2公开(公告)日: 2006-11-14
- 发明人: Takako Yamaguchi , Ryo Kuroda
- 申请人: Takako Yamaguchi , Ryo Kuroda
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2000-036609 20000215; JP2001-017289 20010125
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/02 ; G03F1/00
摘要:
An apparatus for forming a pattern by using a photomask including both a minute aperture where a main component of a transmitted light is an evanescent light and an aperture where a main component of a transmitted light is a propagating light. The apparatus includes a sample stand for placing a substrate to be processed on which a photoresist with a film thickness equal to or smaller than a width of the minute aperture is formed, a stage for placing the photomask, a light source for generating light for exposure, and a device for controlling a distance between the substrate to be processed and the photomask.
公开/授权文献
- US20040023161A1 Pattern-forming apparatus using a photomask 公开/授权日:2004-02-05