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    Pattern-forming apparatus using a photomask
    1.
    发明授权
    Pattern-forming apparatus using a photomask 失效
    使用光掩模的图案形成装置

    公开(公告)号：US07136145B2

    公开(公告)日：2006-11-14

    申请号：US10630792

    申请日：2003-07-31

    申请人： Takako Yamaguchi ,  Ryo Kuroda

    发明人： Takako Yamaguchi ,  Ryo Kuroda

    IPC分类号： G03B27/42 ,  G03B27/02 ,  G03F1/00

    CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F7/16 ,  G03F7/2014 ,  G03F7/70325

    摘要： An apparatus for forming a pattern by using a photomask including both a minute aperture where a main component of a transmitted light is an evanescent light and an aperture where a main component of a transmitted light is a propagating light. The apparatus includes a sample stand for placing a substrate to be processed on which a photoresist with a film thickness equal to or smaller than a width of the minute aperture is formed, a stage for placing the photomask, a light source for generating light for exposure, and a device for controlling a distance between the substrate to be processed and the photomask.

    摘要翻译： 一种用于通过使用包括透射光的主要成分为ev逝光的微小孔和透射光的主要成分为传播光的孔的光掩模形成图案的装置。 该装置包括用于放置待处理基板的样品台，其上形成有薄膜厚度等于或小于微孔宽度的光致抗蚀剂，用于放置光掩模的台，用于产生曝光的光源 以及用于控制待处理基板与光掩模之间的距离的装置。

    Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof
    2.
    发明授权
    Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof 失效
    光调制装置和光开关，移动检测装置和距离测量装置，对准装置和半导体对准器及其处理

    公开(公告)号：US06628392B2

    公开(公告)日：2003-09-30

    申请号：US09931720

    申请日：2001-08-20

    申请人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

    发明人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

    IPC分类号： G01B1100

    CPC分类号： G03F9/703 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7088

    摘要： Disclosed herein is a light modulating apparatus comprising first and second two periodic structures each having a period smaller than the wavelength of light emitted from a light source, and a moving means for relatively moving the two periodic structures, wherein the surface of the first periodic structure is brought near to the surface of the second periodic structure to a space not longer than the wavelength to arrange them in a state opposed to each other, the light incident on the first periodic structure is converted into near-field light by the first periodic structure, the converted near-field light is transmitted through the second periodic structure and converted into propagation light by scattering the near-field light on the back surface of the second periodic structure, and the intensity of the propagation light is modulated by relatively moving the two periodic structures by the moving means.

    摘要翻译： 这里公开了一种光调制装置，其包括第一和第二两个周期性结构，每个周期结构的周期小于从光源发射的光的波长;以及移动装置，用于相对移动两个周期性结构，其中第一周期性结构的表面 被带到第二周期性结构的表面附近到不长于波长的空间以将它们布置成彼此相对的状态，入射到第一周期性结构的光被第一周期性结构转换成近场光 转换的近场光透过第二周期结构传播，并通过散射第二周期结构的背面上的近场光而转换为传播光，并且传播光的强度通过相对移动两个 通过移动装置的周期性结构。

    SENSOR DEVICE AND TESTING METHOD UTILIZING LOCALIZED PLASMON RESONANCE
    3.
    发明申请
    SENSOR DEVICE AND TESTING METHOD UTILIZING LOCALIZED PLASMON RESONANCE 失效
    传感器设备和测试方法利用本地化的PLASMON共振

    公开(公告)号：US20080246970A1

    公开(公告)日：2008-10-09

    申请号：US12131433

    申请日：2008-06-02

    申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    IPC分类号： G01N21/55

    CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

    摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

    摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

    Near-field exposure apparatus and near-field exposure photomask
    4.
    发明授权
    Near-field exposure apparatus and near-field exposure photomask 失效
    近场曝光装置和近场曝光光掩模

    公开(公告)号：US07190438B2

    公开(公告)日：2007-03-13

    申请号：US10779786

    申请日：2004-02-18

    申请人： Takako Yamaguchi ,  Ryo Kuroda

    发明人： Takako Yamaguchi ,  Ryo Kuroda

    IPC分类号： G03B27/02 ,  G03B27/14 ,  G03F1/00 ,  G03F1/14

    CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/70325 ,  G03F7/70783

    摘要： A near-field exposure apparatus including a light source, a stage on which an object to be exposed to light is placed, and a photomask with a deformable membrane portion having on a first surface a light shielding membrane that has a micro aperture and a substrate for supporting a peripheral region of a second surface of the deformable membrane portion. Exposure is conducted with the deformable membrane portion in a sagged condition. The photomask has a stress relieving structure to relieve stress that is generated at a border between the deformable membrane portion and the substrate when the deformable membrane portion sags. The stress relieving structure is one of: a reinforcing member placed at the border, the substrate being partially thinned near the border, and an intermediate layer that is formed between the substrate and the second surface of the deformable membrane portion.

    摘要翻译： 一种近场曝光装置，包括光源，放置有要暴露于光的物体的台，以及具有可变形膜部分的光掩模，该第一表面具有具有微孔的遮光膜和基板 用于支撑可变形膜部分的第二表面的周边区域。 用可变形膜部分处于下垂状态进行曝光。 光掩模具有减轻应力消除结构，以减轻当可变形膜部分下垂时在可变形膜部分和基底之间的边界处产生的应力。 应力消除结构是：位于边界处的加强构件，边界附近部分变薄的基板和形成在基板和可变形膜部分的第二表面之间的中间层。

    Pattern-forming method using photomask, and pattern-forming apparatus
    5.
    发明授权
    Pattern-forming method using photomask, and pattern-forming apparatus 失效
    使用光掩模的图案形成方法和图案形成装置

    公开(公告)号：US06632593B2

    公开(公告)日：2003-10-14

    申请号：US09781331

    申请日：2001-02-13

    申请人： Takako Yamaguchi ,  Ryo Kuroda

    发明人： Takako Yamaguchi ,  Ryo Kuroda

    IPC分类号： G03C500

    CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F7/16 ,  G03F7/2014 ,  G03F7/70325

    摘要： A method of forming a pattern by using a photomask having both a minute aperture where a main component of transmitted light is evanescent light and an aperture where a main component of transmitted light is propagating light. The method includes the steps of forming a photoresist having a film thickness at most equal to a width of the minute aperture on a substrate to be processed, exposing the photoresist by incident light for exposure, and adjusting the film thickness of the photoresist and the conditions of the exposure so as to prevent a photoresist pattern made by the propagating light from extending to an adjacent pattern made by the evanescent light.

    摘要翻译： 通过使用具有透射光的主要成分的微小孔的光掩模和透射光的主要成分传播的光的孔，形成图案的方法。 该方法包括以下步骤：形成具有至多等于待处理基板上的微孔宽度的膜厚度的光致抗蚀剂，通过用于曝光的入射光曝光光致抗蚀剂，并调节光致抗蚀剂的膜厚度和条件 的曝光，以防止由传播光产生的光致抗蚀剂图案延伸到由渐逝光制成的相邻图案。

    Sensor device and testing method utilizing localized plasmon resonance
    6.
    发明授权
    Sensor device and testing method utilizing localized plasmon resonance 失效
    使用局部等离子体共振的传感器装置和测试方法

    公开(公告)号：US07733491B2

    公开(公告)日：2010-06-08

    申请号：US12131433

    申请日：2008-06-02

    申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    IPC分类号： G12Q1/68 ,  G01N1/02 ,  G01N21/55

    CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

    摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

    摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

    Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
    7.
    发明授权
    Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same 失效
    检测曝光掩模和待曝光物体的相对位置的方法，对准方法和使用其的曝光方法

    公开(公告)号：US07592108B2

    公开(公告)日：2009-09-22

    申请号：US10529908

    申请日：2004-05-12

    申请人： Takako Yamaguchi ,  Ryo Kuroda

    发明人： Takako Yamaguchi ,  Ryo Kuroda

    IPC分类号： G03F9/00

    CPC分类号： G03F7/7035 ,  G03F1/22 ,  G03F1/42 ,  G03F7/2039 ,  G03F9/7038

    摘要： A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member supporting the base material, wherein a first alignment mark for rough alignment is provided on the support member and a second alignment mark for fine alignment is provided on the membrane portion, setting the photomask and an object to be exposed in a near-field exposure apparatus, aligning the photomask and the object using the first alignment mark, flexing the membrane portion to contact with the object and detecting a positional relation between the membrane portion and the object using the second alignment mark, aligning the photomask and the object based on the detected positional relation and flexing the membrane portion to contact with the object, and exposing the object to light from a light source by way of the photomask.

    摘要翻译： 一种近场曝光方法，包括制备用于近场曝光的光掩模，具有设置在构成膜部分的基材上的遮光膜和支撑所述基材的支撑构件，其中用于粗略对准的第一对准标记设置在 在膜部分上设置支撑部件和用于精细对准的第二对准标记，将光掩模和要曝光的物体设置在近场曝光装置中，使用第一对准标记对准光掩模和物体，使膜 与物体接触的部分，并使用第二对准标记检测膜部分和物体之间的位置关系，基于检测到的位置关系对准光掩模和物体，并使膜部分弯曲以与物体接触，并将 通过光掩模来对待来自光源的光。