发明授权
- 专利标题: Active faceted mirror system for lithography
- 专利标题(中): 用于光刻的主动分面镜系统
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申请号: US10986076申请日: 2004-11-12
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公开(公告)号: US07136214B2公开(公告)日: 2006-11-14
- 发明人: Erik Loopstra , Stephen Roux
- 申请人: Erik Loopstra , Stephen Roux
- 申请人地址: NL Veldhoven
- 专利权人: ASML Holding N.V.
- 当前专利权人: ASML Holding N.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox PLLC
- 主分类号: G02B26/00
- IPC分类号: G02B26/00
摘要:
An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.
公开/授权文献
- US20060103908A1 Active faceted mirror system for lithography 公开/授权日:2006-05-18
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