公开(公告)号：US07136214B2

公开(公告)日：2006-11-14

申请号：US10986076

申请日：2004-11-12

Applicant: Erik Loopstra ,  Stephen Roux

Inventor： Erik Loopstra ,  Stephen Roux

IPC: G02B26/00

CPC classification number: G02B27/0977 ,  G02B7/1827 ,  G02B27/0905 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70291

Abstract: An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.

Abstract translation: 公开了一种主动刻面镜系统。 主动分面镜系统包括一组主动分面镜装置，底板和一组用于将活动小面镜装置安装到基板的销。 每个活性刻面镜装置包括具有反射表面的反射镜基板和用于安装的反面上的轴承孔。 此外，每个活动刻面镜装置包括位于镜基板背面的至少三个致动器目标，宝石轴承和用于支撑镜面基板的挠曲件。 基板包括用于安装主动分面镜装置的一系列轴承孔和用于每个主动分面镜装置的至少三个致动器。 可以使用位于基板上的一组小面控制器来控制活动小面镜装置的定位以产生期望的照明效果。

公开(公告)号：US20060077372A1

公开(公告)日：2006-04-13

申请号：US10962550

申请日：2004-10-13

Applicant: Stephen Roux ,  Erik Loopstra ,  Michael Nelson

Inventor： Stephen Roux ,  Erik Loopstra ,  Michael Nelson

IPC: G03B27/72

CPC classification number: G03F7/70558 ,  G03F7/70066

Abstract: An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system comprising a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system of the photolithography system and a reticle stage of the photolithography system so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The blade structure is either translucent to a wavelength of the light or opaque to the wavelength. The first portion of the light has a first area. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that, when the illumination system provides the light having the illumination field, a second portion of the light within the illumination field impinges upon the blade structure. The second portion of the light has a second area. The second area is different from the first area.

Abstract translation: 一种用于改变包括叶片结构和第一致动器的光刻系统的照明场内的光聚集强度的装置。 刀片结构被配置为沿着光刻系统的光路定位在光刻系统的照明系统和光刻系统的光罩台之间，使得当照明系统提供具有照明场的光时，叶片结构 基本上在照明场的中心，并且照明场内的光的第一部分撞击在叶片结构上。 叶片结构对于光的波长是半透明的或对于波长是不透明的。 光的第一部分具有第一区域。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且构造成在第一方向上至少移动叶片结构的第一部分，使得当照明系统提供具有 照明场，照明场内的光的第二部分照射在叶片结构上。 光的第二部分具有第二区域。 第二个区域与第一个区域不同。

公开(公告)号：US20070013891A1

公开(公告)日：2007-01-18

申请号：US11523695

申请日：2006-09-20

Applicant: Stephen Roux ,  Erik Loopstra ,  Michael Nelson

Inventor： Stephen Roux ,  Erik Loopstra ,  Michael Nelson

IPC: G03B27/72

CPC classification number: G03F7/70558 ,  G03F7/70066

Abstract: An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.

Abstract translation: 一种用于改变具有叶片结构和第一致动器的光刻系统的照明场中的光的聚集强度的装置。 叶片结构被构造成沿着光刻系统的光路在照明系统和标线镜台之间定位，使得当照明系统提供具有照明场的光时，叶片结构基本上处于照明的中心 并且照明场内的光的第一部分撞击在叶片结构上。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且被配置成沿着第一方向移动至少第一部分叶片结构，使得第一部分的光在照明区域内 撞击在叶片结构上。

公开(公告)号：US07633599B2

公开(公告)日：2009-12-15

申请号：US11523695

申请日：2006-09-20

Applicant: Stephen Roux ,  Erik Loopstra ,  Michael L. Nelson

Inventor： Stephen Roux ,  Erik Loopstra ,  Michael L. Nelson

IPC: G03B27/72 ,  G03B27/42

CPC classification number: G03F7/70558 ,  G03F7/70066

Abstract: An apparatus for changing an intensity distribution of a light within an illumination field includes a structure configured to be positioned within the illumination field so that a first portion of the light within the illumination field impinges upon the structure, where the structure is translucent or opaque to a wavelength of the light. The apparatus also includes an actuator configured to cause a movement of a first portion of the structure so that a second portion of the light within the illumination field impinges upon the structure. The light within the illumination field is produced by a source configured so that a pupil fill of a beam of the light is uncontrolled, but the beam of the light downstream of the structure is substantially telecentric before and after the movement of the first portion of the structure. Related methods are also presented.

Abstract translation: 用于改变照明场中的光的强度分布的装置包括被配置为定位在照明场内的结构，使得照明场内的光的第一部分照射在结构上，其中结构是半透明的或不透明的 光的波长。 该装置还包括致动器，该致动器被配置为引起结构的第一部分的移动，使得照明场内的光的第二部分撞击该结构。 照明场内的光由源构成，使得光束的光瞳填充不受控制，但是结构的下游光的光束在第一部分的移动之前和之后基本上是远心的 结构体。 还提出了相关方法。

公开(公告)号：US20060103908A1

公开(公告)日：2006-05-18

申请号：US10986076

申请日：2004-11-12

Applicant: Erik Loopstra ,  Stephen Roux

Inventor： Erik Loopstra ,  Stephen Roux

IPC: G02B26/00

CPC classification number: G02B27/0977 ,  G02B7/1827 ,  G02B27/0905 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70291

Abstract: An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.

公开(公告)号：US07119883B2

公开(公告)日：2006-10-10

申请号：US10962550

申请日：2004-10-13

Applicant: Stephen Roux ,  Erik Loopstra ,  Michael L. Nelson

Inventor： Stephen Roux ,  Erik Loopstra ,  Michael L. Nelson

IPC: G03B27/72 ,  G03B27/42

CPC classification number: G03F7/70558 ,  G03F7/70066

Abstract: An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.

Abstract translation: 一种用于改变具有叶片结构和第一致动器的光刻系统的照明场中的光的聚集强度的装置。 叶片结构被构造成沿着光刻系统的光路在照明系统和标线镜台之间定位，使得当照明系统提供具有照明场的光时，叶片结构基本上处于照明的中心 并且照明场内的光的第一部分撞击在叶片结构上。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且被配置成沿着第一方向移动至少第一部分叶片结构，使得第一部分的光在照明区域内 撞击在叶片结构上。

公开(公告)号：US20070263201A1

公开(公告)日：2007-11-15

申请号：US11433767

申请日：2006-05-15

Applicant: Erik Loopstra ,  Joost Ottens

Inventor： Erik Loopstra ,  Joost Ottens

IPC: G03B27/58

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707

Abstract: An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

Abstract translation: 公开了一种用于支撑用于光刻处理目的的物品的物品支撑。 物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置，其中通道配置包括输入通道结构和输出通道结构，输入和输出通道结构布置成嵌套 配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 还公开了并入物品支撑件的光刻设备和设备制造。

公开(公告)号：US20070247605A1

公开(公告)日：2007-10-25

申请号：US11410282

申请日：2006-04-25

Applicant: Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

Inventor： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

IPC: G03B27/52

CPC classification number: G03B27/52 ,  G02B27/0068 ,  G03F7/70266

Abstract: An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

Abstract translation: 用于校正光学装置中的像差的光学元件具有壳体。 壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。 外壳容纳几个执行器。 每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。 每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。 光学元件可以用在光刻设备中。

公开(公告)号：US20070216881A1

公开(公告)日：2007-09-20

申请号：US11377636

申请日：2006-03-17

Applicant: Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

Inventor： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

IPC: G03B27/42

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733

Abstract: A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.

Abstract translation: 提供了可移动构件，其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。 可移动构件可以缩回到缩回位置，在缩回位置，其不再延伸超过保险杠。 以这种方式，可以将两个基板台移动到一起，并允许可伸缩构件在液体供应系统之下通过，该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。

公开(公告)号：US20070159616A1

公开(公告)日：2007-07-12

申请号：US10894367

申请日：2004-07-20

Applicant: Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

Inventor： Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

IPC: G03B27/62

CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825 ,  G03F7/709

Abstract: The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

Abstract translation: 本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。 光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。 对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。