Invention Grant
- Patent Title: System, method and apparatus for self-cleaning dry etch
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Application No.: US10802460Application Date: 2004-03-16
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Publication No.: US07140374B2Publication Date: 2006-11-28
- Inventor: Andrew D. Bailey, III , Shrikant P. Lohokare , Arthur M. Howald , Yunsang Kim
- Applicant: Andrew D. Bailey, III , Shrikant P. Lohokare , Arthur M. Howald , Yunsang Kim
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla & Gencarella, LLP
- Main IPC: B08B9/00
- IPC: B08B9/00 ; B44C1/22

Abstract:
A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A cleaning chemistry is injected into the processing chamber. The cleaning chemistry can be reactive with a second one of the species to convert the second species to the first species. The volatilized first species can also be output from the processing chamber. A system for cleaning the process chamber is also described.
Public/Granted literature
- US20050093012A1 System, method and apparatus for self-cleaning dry etch Public/Granted day:2005-05-05
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