- 专利标题: System, method and apparatus for self-cleaning dry etch
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申请号: US10802460申请日: 2004-03-16
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公开(公告)号: US07140374B2公开(公告)日: 2006-11-28
- 发明人: Andrew D. Bailey, III , Shrikant P. Lohokare , Arthur M. Howald , Yunsang Kim
- 申请人: Andrew D. Bailey, III , Shrikant P. Lohokare , Arthur M. Howald , Yunsang Kim
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: Martine Penilla & Gencarella, LLP
- 主分类号: B08B9/00
- IPC分类号: B08B9/00 ; B44C1/22
摘要:
A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A cleaning chemistry is injected into the processing chamber. The cleaning chemistry can be reactive with a second one of the species to convert the second species to the first species. The volatilized first species can also be output from the processing chamber. A system for cleaning the process chamber is also described.
公开/授权文献
- US20050093012A1 System, method and apparatus for self-cleaning dry etch 公开/授权日:2005-05-05
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