发明授权
US07141354B2 Photo radical generator, photo sensitive resin composition and article
失效
光自由基发生器,感光树脂组合物及制品
- 专利标题: Photo radical generator, photo sensitive resin composition and article
- 专利标题(中): 光自由基发生器,感光树脂组合物及制品
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申请号: US10946782申请日: 2004-09-22
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公开(公告)号: US07141354B2公开(公告)日: 2006-11-28
- 发明人: Katsuya Sakayori
- 申请人: Katsuya Sakayori
- 申请人地址: JP Tokyo-to
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo-to
- 代理机构: Seyfarth Shaw LLP
- 代理商 Timothy J. Keefer
- 优先权: JP2003-342340 20030930
- 主分类号: G03C1/73
- IPC分类号: G03C1/73 ; C08F116/36 ; C08F216/36
摘要:
The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an article using the radical generator. The photoradical generator provided according to the invention contains a compound (a) having one or more self-cleavage type radical-generating parts and one or more ethylenic unsaturated groups in one molecule.
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