摘要:
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.
摘要:
Monomers and polymerizable compositions that can be polymerized using a free-radical polymerization reaction are provided. The monomers have two vinyl groups as well as a spirobisindane-type structure. Polymers prepared from the polymerizable compositions are also provided. The polymers can be porous.
摘要:
Monomers and polymerizable compositions that can be polymerized using a free-radical polymerization reaction are provided. The monomers have two vinyl groups as well as a spirobisindane-type structure. Polymers prepared from the polymerizable compositions are also provided. The polymers can be porous.
摘要:
Solute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive hydrogen abstracting groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers.
摘要:
A process for preparing a water-soluble polymer dispersion is herein provided which is characterized by polymerizing from about 10 to 50 mole percent of a monomer having a formula (II); from about 1 to 50 mole percent of N-alkylacrylamide, N, N-dialkylacrylamide or mixtures thereof; having a formula (III) from about 1 to 70 mole percent acrylamide; and optionally up to about 4 mole percent of a monomer having a formula (I) having a benzyl functionality. The polymerization is carried out in the presence of an aqueous solution of a polyvalent anionic salt which contains (1) a water soluble cationic polymer which is insoluble in the aqueous salt solution and (2) a water soluble cationic polymer which is soluble in the aqueous salt solution.
摘要:
Aqueous dispersions of a copolymer obtained by free-radical polymerization and containing from 0.01 to 40% w/w of polymerized units of comonomers having at least one aldehyde or keto group, which dispersions contain at least one polyisocyanate in which the isocyanate groups are blocked by oximes.
摘要:
The invention relates to copolymers consisting of 30-100 mol %, relative to the total polymer, of structural units of the formulae I and II, the proportion of structural units of the formula I, relative to the proportion of I and II, being 5 to 95 mol %, ##STR1## in which R.sup.1 is C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 alkoxy or halogen, R.sup.2 is hydrogen or --COR.sup.3 and R.sup.3 is C.sub.1 -C.sub.20 alkyl, m is 1, 2 or 3, n is 0, 1, 2, 3 or 4 and the sum of m and n is not more than 5, and A is selected from the group of radicals consisting of halogen, cyano or structural units of the formulae III to VIII ##STR2## in which R.sup.4 and R.sup.6 independently of one another are hydroxyl, ##STR3## or glycidyl groups of the formula IXa or IXb ##STR4## R.sup.5 and R.sup.7 independently of one another are C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 -alkoxy or halogen, o and q independently of one another are 0, 1, 2 or 3, p and r independently of one another are 0, 1,2,3, 4 or 5, it being necessary for the totals o+p and q+4 to be not more than 5, R.sup.8 is hydrogen, C.sub.1 -C.sub.20 -alkyl, a glycidyl radical of formula IXa or a radical of formula VI, R.sup.9 is hydrogen, C.sub.1 -C.sub.20 -alkyl, cycloalkyl having 5-7 ring C atoms, phenyl, naphthyl or benzyl, R.sup.10 is hydrogen, C.sub.1 -C.sub.20 - or a glycidyl radical of the formula IXa, and the groups R.sup.11 and R.sup.12 independently of one another are hydrogen, C.sub.1 -C.sub.20 -alkyl, cycloalkyl having 5-7 ring C atoms, aryl or aralkyl which is substituted or unsubstituted or a glycidyl radical of the formula IXa, or, together with the common nitrogen atom, form a five-membered or six-membered, non-aromatic, heterocyclic ring, and R.sup.13 and R.sup.14 independently of one another are hydrogen or methyl, it being possible for the radicals R.sup.1 to R.sup.14 and A of a polymer molecule to be different, within the definitions given.The compounds are distinguished by high glass transition temperatures and good flexibility and can be employed as binders in photoresist systems. The representatives containing glycidyl groups can also be used as self-crosslinking epoxide resins.
摘要:
A radiation sensitive polymer material having (a) one or more repeating units of the formula: ##STR1## wherein R is an alkyl group, a halogen atom, a hydrogen atom or a dimethylamino group, and (b) an addition polymerizable repeating unit derived from a compound having a CH.sub.2 .dbd.C
摘要翻译:一种辐射敏感性聚合物材料,其具有(a)一个或多个下式的重复单元:其中R是烷基,卤素原子,氢原子或二甲基氨基,和(b)可加聚的重复单元衍生 从分子中具有CH 2 = C <基团的化合物可以得到具有优异的抗干蚀刻性和对辐射高度敏感的正型抗蚀剂。
摘要:
A waterborne one-component coating composition capable of self-crosslinking and exhibiting a gloss and hardness improvement when cured that is similar to a solventborne two-component composition. The composition includes a urethane phase including a polyurethane polymer with at least polyester diol monomer units, polycarbonate diol monomer units, and ketone-functionalized diol monomer units. The composition may include an optional acrylic phase including an acrylic polymer having monomer units selected from one of alkyl (meth)acrylate monomer units, vinyl acetate monomer units, styrene monomer units, ketone-functional vinyl monomer units, or combinations thereof. The composition includes a hydrazine-functionalized crosslinking agent configured to crosslink one of the ketone-functionalized diol monomer units, the ketone-functional vinyl monomer units, or both. The composition further includes one or more tertiary amine reaction moderators or neutralizing agents.