发明授权
US07148973B2 Position detecting method and apparatus, exposure apparatus and device manufacturing method
有权
位置检测方法和装置，曝光装置和装置的制造方法
- 专利标题： Position detecting method and apparatus, exposure apparatus and device manufacturing method
- 专利标题（中）： 位置检测方法和装置，曝光装置和装置的制造方法
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申请号： US11169789申请日： 2005-06-30
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公开(公告)号： US07148973B2公开(公告)日： 2006-12-12
- 发明人: Koichi Sentoku , Hideki Ina , Takehiko Suzuki , Satoru Oishi
- 申请人： Koichi Sentoku , Hideki Ina , Takehiko Suzuki , Satoru Oishi
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scino
- 优先权： JP2001-153125 20010522
- 主分类号： G01B11/14
- IPC分类号： G01B11/14 ; G01N21/86 ; G03B27/42
摘要：
A method of determining relative position between a reflective reticle and a substrate includes a detection step of detecting relative position between a transmissive reference mark on a reticle stage and a substrate alignment mark on a substrate stage through a reflective optical system which projects a pattern of the reflective reticle onto the substrate with extreme ultraviolet light, and a determination step of determining relative position between the reflective reticle and the substrate based on the detection result in the detection step.
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