发明授权
US07161162B2 Electron beam pattern generator with photocathode comprising low work function cesium halide
失效
具有光电阴极的电子束图案发生器，其包含低功函数卤化铯
- 专利标题： Electron beam pattern generator with photocathode comprising low work function cesium halide
- 专利标题（中）： 具有光电阴极的电子束图案发生器，其包含低功函数卤化铯
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申请号： US10282324申请日： 2002-10-10
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公开(公告)号： US07161162B2公开(公告)日： 2007-01-09
- 发明人: Juan Ramon Maldonado , Steven T. Coyle
- 申请人： Juan Ramon Maldonado , Steven T. Coyle
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Janah & Associates, P.C.
- 主分类号： H01J37/073
- IPC分类号： H01J37/073 ; H01J37/317
摘要：
An electron beam pattern generator comprises a laser beam generator to generate a laser beam. A photocathode receives the laser beam and generates one or more electron beams. The photocathode comprises cesium halide material, such as for example, cesium bromide or iodide. The cesium halide material may have a decreased workfunction that allows efficient operation at a wavelength of the laser beam of at least about 200 nm. Electron optics are provided to focus the electron beams onto a substrate that is supported on a substrate support.