发明授权
- 专利标题: Method of selective region vapor phase aluminizing
- 专利标题(中): 选择性区域气相镀铝的方法
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申请号: US10685637申请日: 2003-10-15
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公开(公告)号: US07163718B2公开(公告)日: 2007-01-16
- 发明人: Nripendra Nath Das , Joseph David Rigney , Jeffrey Allan Pfaendtner , Matthew David Saylor
- 申请人: Nripendra Nath Das , Joseph David Rigney , Jeffrey Allan Pfaendtner , Matthew David Saylor
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 代理机构: McNees Wallace & Nurick LLC
- 主分类号: C23C16/00
- IPC分类号: C23C16/00
摘要:
A process for forming diffusion aluminide coatings on an uncoated surface of a substrate, without interdiffusing a sufficient amount of aluminum into a coating layer to adversely affect the coating growth potential and mechanical properties of said coating layer. A metal substrate is provided comprising an external surface and an internal passage therein defined by an internal surface, at least a portion of the external surface of the substrate being coated with a coating layer selected from the group consisting of β-NiAl-base, MCrAlX, a line-of-sight diffusion aluminide, a non-line-of-sight diffusion aluminide, a pack diffusion aluminide, and a slurry diffusion aluminide on said substrate. The metal substrate is subjected to an aluminum vapor phase deposition process.
公开/授权文献
- US20050084706A1 Method of selective region vapor phase aluminizing 公开/授权日:2005-04-21
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