Invention Grant
- Patent Title: Electrical feed-through structure and method
- Patent Title (中): 电气馈通结构和方法
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Application No.: US10072607Application Date: 2002-02-08
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Publication No.: US07164142B2Publication Date: 2007-01-16
- Inventor: Jimmy Vishnipolsky , Efim Vinnitsky , Eliyahu Almog
- Applicant: Jimmy Vishnipolsky , Efim Vinnitsky , Eliyahu Almog
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Tarek N. Fahmi
- Main IPC: H01J37/30
- IPC: H01J37/30 ; H01B7/00

Abstract:
Electrical lead-through systems from atmospheric into vacuum environments are presented. Electrical feed-through structures (EFTS) comprised of a multiplicity of parallel connection lines used to operate e-beam tip-array sources in high vac environments for chip lithography are disclosed. In one embodiment, an EFTS comprises a sheet of insulating material having conductive tracks extending along potions of the sheet and a vacuum seal separating one portion from another portion of the sheet so as to maintain a pressure differential among multiple portions of the sheet.
Public/Granted literature
- US20030150630A1 Electrical feed-through structure and method Public/Granted day:2003-08-14
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