Invention Grant
- Patent Title: Photosensitive metal nanoparticle and method of forming conductive pattern using the same
- Patent Title (中): 感光金属纳米颗粒及使用其形成导电图案的方法
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Application No.: US10734138Application Date: 2003-12-15
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Publication No.: US07166412B2Publication Date: 2007-01-23
- Inventor: Jong Jin Park , Eun Jeong Jeong , Sang Yoon Lee
- Applicant: Jong Jin Park , Eun Jeong Jeong , Sang Yoon Lee
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: KR10-2003-0037040 20030610
- Main IPC: G03C1/735
- IPC: G03C1/735 ; G03F7/028

Abstract:
A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.
Public/Granted literature
- US20040253536A1 Photosensitive metal nanoparticle and method of forming conductive pattern using the same Public/Granted day:2004-12-16
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