发明授权
- 专利标题: Photosensitive metal nanoparticle and method of forming conductive pattern using the same
- 专利标题(中): 感光金属纳米颗粒及使用其形成导电图案的方法
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申请号: US10734138申请日: 2003-12-15
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公开(公告)号: US07166412B2公开(公告)日: 2007-01-23
- 发明人: Jong Jin Park , Eun Jeong Jeong , Sang Yoon Lee
- 申请人: Jong Jin Park , Eun Jeong Jeong , Sang Yoon Lee
- 申请人地址: KR Suwon-Si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-Si
- 代理机构: Buchanan Ingersoll & Rooney PC
- 优先权: KR10-2003-0037040 20030610
- 主分类号: G03C1/735
- IPC分类号: G03C1/735 ; G03F7/028
摘要:
A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.
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