发明授权
- 专利标题： Dielectric materials for electronic devices
- 专利标题（中）： 用于电子设备的电介质材料
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申请号： US10982472申请日： 2004-11-05
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公开(公告)号： US07170093B2公开(公告)日： 2007-01-30
- 发明人: Yiliang Wu , Beng S. Ong , Ping Liu
- 申请人： Yiliang Wu , Beng S. Ong , Ping Liu
- 申请人地址： US CT Stamford
- 专利权人： Xerox Corporation
- 当前专利权人： Xerox Corporation
- 当前专利权人地址： US CT Stamford
- 代理机构： Fay, Sharpe, Fagan, Minnich & McKee LLP
- 代理商 Eugene O. Palazzo
- 主分类号： H01L29/04
- IPC分类号： H01L29/04
摘要：
A dielectric material prepared from a siloxy/metal oxide hybrid composition, and electronic devices such as thin film transistors comprising such dielectric material are provided herein. The siloxy/metal oxide hybrid composition comprises a siloxy component such as, for example, a siloxane or silsesquioxane. The siloxy/metal oxide hybrid composition is useful for the preparation of dielectric layers for thin film transistors using solution deposition techniques.
公开/授权文献
- US20060097360A1 Dielectric materials for electronic devices 公开/授权日：2006-05-11