Invention Grant
- Patent Title: Method and apparatus for inspecting a substrate
- Patent Title (中): 用于检查基板的方法和装置
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Application No.: US10017860Application Date: 2001-12-14
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Publication No.: US07171038B2Publication Date: 2007-01-30
- Inventor: David Adler , Kirk Bertsche , Mark McCord , Stuart Friedman
- Applicant: David Adler , Kirk Bertsche , Mark McCord , Stuart Friedman
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corporation
- Current Assignee: KLA-Tencor Technologies Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
A method and apparatus for inspection and review of defects is disclosed wherein data gathering is improved. In one embodiment, multiple or segmented detectors are used in a particle beam system.
Public/Granted literature
- US20020161534A1 Method and apparatus for inspecting a substrate Public/Granted day:2002-10-31
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