Invention Grant
- Patent Title: Method of manufacturing an image device
- Patent Title (中): 制造图像装置的方法
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Application No.: US11168423Application Date: 2005-06-29
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Publication No.: US07172920B2Publication Date: 2007-02-06
- Inventor: Sumio Ikegawa , Kohei Nakayama , Hideyuki Funaki , Yoshinori Iida , Keitaro Shigenaka
- Applicant: Sumio Ikegawa , Kohei Nakayama , Hideyuki Funaki , Yoshinori Iida , Keitaro Shigenaka
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- Priority: JP2002-081795 20020322
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An imaging device comprises a select line, a first signal line crossing the select line, and a first pixel provided at a portion corresponding to a crossing portion of the select line and the first signal line, the first pixel comprising a first buffer layer formed on a substrate, a first bolometer film formed on the first buffer layer, made of a compound which undergoes metal-insulator transition, and generating a first temperature detection signal, a first switching element formed on the substrate, selected by a select signal from the select line, and supplying the first temperature detection signal to the first signal line, and a metal wiring connecting a top surface of the first bolometer film to the first switching element.
Public/Granted literature
- US20060231911A1 Method of manufacturing and image device Public/Granted day:2006-10-19
Information query
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