Invention Grant
- Patent Title: Polysilicon crystallizing method, method of fabricating thin film transistor using the same, and method of fabricating liquid crystal display thereof
- Patent Title (中): 多晶硅结晶方法,使用其制造薄膜晶体管的方法及其制造方法
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Application No.: US10189770Application Date: 2002-07-08
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Publication No.: US07172952B2Publication Date: 2007-02-06
- Inventor: Se Jin Chung
- Applicant: Se Jin Chung
- Applicant Address: KR Seoul
- Assignee: LG.Philips LCD Co., Ltd.
- Current Assignee: LG.Philips LCD Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR2001-41668 20010711
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A method of crystallizing polysilicon, a method of fabricating a thin film transistor using the same, and a method of fabricating a liquid crystal display thereof form a polysilicon layer having uniformly oriented crystalline grains with high quality. A polysilicon crystallizing method includes forming a polysilicon layer on a substrate, making grains of the polysilicon layer amorphous except a portion of the grains having specific orientation, and crystallizing the polysilicon layer using the grains having the specific orientation.
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