Invention Grant

  • Patent Title: Polysilicon crystallizing method, method of fabricating thin film transistor using the same, and method of fabricating liquid crystal display thereof
  • Patent Title (中): 多晶硅结晶方法,使用其制造薄膜晶体管的方法及其制造方法
  • Application No.: US10189770
    Application Date: 2002-07-08
  • Publication No.: US07172952B2
    Publication Date: 2007-02-06
  • Inventor: Se Jin Chung
  • Applicant: Se Jin Chung
  • Applicant Address: KR Seoul
  • Assignee: LG.Philips LCD Co., Ltd.
  • Current Assignee: LG.Philips LCD Co., Ltd.
  • Current Assignee Address: KR Seoul
  • Agency: McKenna Long & Aldridge LLP
  • Priority: KR2001-41668 20010711
  • Main IPC: H01L21/20
  • IPC: H01L21/20
Polysilicon crystallizing method, method of fabricating thin film transistor using the same, and method of fabricating liquid crystal display thereof
Abstract:
A method of crystallizing polysilicon, a method of fabricating a thin film transistor using the same, and a method of fabricating a liquid crystal display thereof form a polysilicon layer having uniformly oriented crystalline grains with high quality. A polysilicon crystallizing method includes forming a polysilicon layer on a substrate, making grains of the polysilicon layer amorphous except a portion of the grains having specific orientation, and crystallizing the polysilicon layer using the grains having the specific orientation.
Information query
Patent Agency Ranking
0/0