Invention Grant
US07173763B2 Optical interleaver and filter cell design with enhanced clear aperture
有权
光学交织器和滤波器电池设计,增强了清晰的光圈
- Patent Title: Optical interleaver and filter cell design with enhanced clear aperture
- Patent Title (中): 光学交织器和滤波器电池设计,增强了清晰的光圈
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Application No.: US10866443Application Date: 2004-06-11
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Publication No.: US07173763B2Publication Date: 2007-02-06
- Inventor: Tengda Du , Kevin Dapeng Zhang , Xin Luo
- Applicant: Tengda Du , Kevin Dapeng Zhang , Xin Luo
- Applicant Address: US CA Sunnyvale
- Assignee: Finisar Corporation
- Current Assignee: Finisar Corporation
- Current Assignee Address: US CA Sunnyvale
- Agency: Workman Nydegger
- Main IPC: G02B5/30
- IPC: G02B5/30

Abstract:
An optical interleaver for use in a range of telecommunications applications including optical multiplexers/demultiplexers and optical routers. The optical device includes an optical processing loop which allows multi-stage performance characteristics to be achieved with a single physical filtration stage. Optical processing on the first leg and second legs of the loop is asymmetrical thereby improving the integrity of the optical signals by effecting complementary chromatic dispersion on the first and second legs. A fundamental filter cell within the interleaver filters optical signals propagating on each of the two legs of the optical loop which intersects the fundamental filter cell.
Public/Granted literature
- US20040246582A1 Optical interleaver and filter cell design with enhanced clear aperture Public/Granted day:2004-12-09
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