- 专利标题： Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
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申请号： US10725571申请日： 2003-12-03
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公开(公告)号： US07175943B2公开(公告)日： 2007-02-13
- 发明人: Masafumi Asano , Tadahito Fujisawa , Satoshi Tanaka
- 申请人： Masafumi Asano , Tadahito Fujisawa , Satoshi Tanaka
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JPP2002-352819 20021204
- 主分类号： G01F9/00
- IPC分类号： G01F9/00
摘要：
A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque portion covering the first opaque portion in an area occupied by the circuit pattern and an extending portion connected to one end of the first opaque portion and extending outside the area when the second photomask is aligned with a pattern delineated on a substrate by the first photomask.