发明授权
- 专利标题: Method of and apparatus for determining the amount of impurity in gas
- 专利标题(中): 测定气体中杂质量的方法和装置
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申请号: US11181777申请日: 2005-07-15
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公开(公告)号: US07176464B2公开(公告)日: 2007-02-13
- 发明人: Koichi Oka , Satoshi Nitta
- 申请人: Koichi Oka , Satoshi Nitta
- 申请人地址: JP Osaka
- 专利权人: Otsuka Electronics Co., Ltd.
- 当前专利权人: Otsuka Electronics Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Finnegan, Henderson, Farabow, Garrett, & Dunner, L.L.P.
- 优先权: JP2004-210693 20040716
- 主分类号: G01J5/02
- IPC分类号: G01J5/02
摘要:
Impurity is removed from gas, the resultant gas is introduced into a cell 15, and the intensity of light transmitted through the cell 15 is measured as a reference. Gas containing impurity of which concentration is known, is introduced into the cell 15, and the intensity of light transmitted through the cell 15 is measured with the temperature and pressure maintained at those used at the measurement of the reference light intensity. Then, the absorbance of the impurity is obtained according to the ratio of the two light intensity data obtained by the two measurements above-mentioned. The impurity absorbance thus obtained is stored, in a memory 20a, as a function of an impurity concentration. Gas containing impurity of which concentration is unknown, is introduced into the cell 15, and the intensity of light transmitted through the cell 15 is measured with the temperature and pressure maintained at those used at the measurements above-mentioned. The absorbance of the impurity is obtained according to the last-measured light intensity and the reference light intensity. The absorbance thus obtained is applied to the function, thereby to obtain the impurity concentration.
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