发明授权
- 专利标题: Exposure apparatus and method
- 专利标题(中): 曝光装置和方法
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申请号: US11022033申请日: 2004-12-23
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公开(公告)号: US07177006B2公开(公告)日: 2007-02-13
- 发明人: Toshinobu Tokita
- 申请人: Toshinobu Tokita
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Morgan & Finnegan, L.L.P.
- 优先权: JP2003-433009 20031226
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42 ; G03B27/72 ; G03B27/32
摘要:
An exposure method includes the steps of introducing fluid to a space between a surface of an object to be exposed, and a final surface of a projection optical system, projecting a pattern on a mask onto the object via the projection optical system and the fluid, wherein the introducing step includes the steps of filling the fluid in the space between the surface of the object and the final surface of the projection optical system, and wherein the filling step changes a capillary attraction of the fluid different from the capillary attraction that operates during the projection step.
公开/授权文献
- US20050254026A1 Exposure apparatus and method 公开/授权日:2005-11-17