发明授权
- 专利标题: Structure and method of manufacturing the same
- 专利标题(中): 其制造方法及结构
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申请号: US10964614申请日: 2004-10-15
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公开(公告)号: US07179718B2公开(公告)日: 2007-02-20
- 发明人: Takashi Nakamura , Tetsu Miyoshi
- 申请人: Takashi Nakamura , Tetsu Miyoshi
- 申请人地址: JP Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2003-357608 20031017; JP2004-093221 20040326
- 主分类号: H01L21/30
- IPC分类号: H01L21/30
摘要:
A method of manufacturing a structure in which a substrate can be removed easily from a structure that has been formed on the substrate by using a film forming technology. The method of manufacturing a structure includes the steps of (a) forming an intermediate layer on a substrate; (b) forming a structure including a brittle material layer on the intermediate layer by at least using a spray deposition method of spraying material powder toward the substrate, on which the intermediate layer is formed, to deposit the material powder; and (c) removing the substrate from the structure.
公开/授权文献
- US20050082662A1 Structure and method of manufacturing the same 公开/授权日:2005-04-21
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