发明授权
- 专利标题： Poly(arylene ether) dielectrics
- 专利标题（中）： 聚（亚芳基醚）电介质
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申请号： US11028774申请日： 2005-01-04
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公开(公告)号： US07179879B2公开(公告)日： 2007-02-20
- 发明人: Christopher Lim , Siu Choon Ng , Hardy Chan , Simon Chooi , Mei Sheng Zhou
- 申请人： Christopher Lim , Siu Choon Ng , Hardy Chan , Simon Chooi , Mei Sheng Zhou
- 申请人地址： SG Singapore
- 专利权人： Chartered Semiconductor Manufacturing Ltd.
- 当前专利权人： Chartered Semiconductor Manufacturing Ltd.
- 当前专利权人地址： SG Singapore
- 代理机构： Saile Ackerman LLC
- 代理商 Stephen B. Ackerman
- 主分类号： C08G65/00
- IPC分类号： C08G65/00
摘要：
The present invention relates to poly(arylene ethers) used as low k dielectric layers in electronic applications and articles containing such poly(arylene ethers) comprising the structure: wherein n=5 to 10000 and monovalent Ar1 and divalent Ar2 are selected from a group of heteroaromatic compounds that incorporate O, N, Se, S, or Te or combinations of the aforesaid elements, including but not limited to:
公开/授权文献
- US20050159576A1 Novel poly(arylene ether) dielectrics 公开/授权日：2005-07-21
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