发明授权
- 专利标题： Apparatus for providing gas to a processing chamber
- 专利标题（中）： 用于向处理室提供气体的装置
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申请号： US10198727申请日： 2002-07-17
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公开(公告)号： US07186385B2公开(公告)日： 2007-03-06
- 发明人: Seshadri Ganguli , Ling Chen , Vincent W. Ku
- 申请人： Seshadri Ganguli , Ling Chen , Vincent W. Ku
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan LLP
- 主分类号： A01G13/06
- IPC分类号： A01G13/06 ; B01D7/00 ; C23C14/00 ; F24F3/14 ; A61M16/00
摘要：
An apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precursor material is adapted to produce a gas vapor when heated to a defined temperature at a defined pressure. The baffle forces a carrier gas to travel an extended mean path between the inlet and outlet ports. In another embodiment, an apparatus for generating gas includes a canister having a tube that directs a carrier gas flowing into the canister away from a precursor material disposed within the canister.
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