发明授权
US07198447B2 Semiconductor device producing apparatus and producing method of semiconductor device
有权
半导体装置的制造装置及半导体装置的制造方法
- 专利标题: Semiconductor device producing apparatus and producing method of semiconductor device
- 专利标题(中): 半导体装置的制造装置及半导体装置的制造方法
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申请号: US10360597申请日: 2003-02-06
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公开(公告)号: US07198447B2公开(公告)日: 2007-04-03
- 发明人: Kazuhiro Morimitsu , Tatsuhisa Matsunaga , Masanori Kaneko , Kouichi Noto , Hidehiro Yanagawa , Masaki Matsushima
- 申请人: Kazuhiro Morimitsu , Tatsuhisa Matsunaga , Masanori Kaneko , Kouichi Noto , Hidehiro Yanagawa , Masaki Matsushima
- 申请人地址: JP Tokyo
- 专利权人: Hitachi Kokusai Electric Inc.
- 当前专利权人: Hitachi Kokusai Electric Inc.
- 当前专利权人地址: JP Tokyo
- 代理机构: Hogan & Hartson LLP
- 优先权: JP2002-266585 20020912
- 主分类号: H01L21/677
- IPC分类号: H01L21/677 ; B65B21/02 ; B65B69/00 ; B65G65/34
摘要:
A semiconductor device producing apparatus is disclosed. The apparatus includes a carrier-holding stage for placing a carrier; first, second and third stages each for holding first and second boats one at a time, each boat holding one or more substrates; a boat transfer mechanism for transferring the boats among the first, second and third stages; and a substrate transfer mechanism for transferring the substrate(s) from the carrier to the boat held by the first stage. A controller controls the first stage, the boat transfer mechanism and the substrate transfer mechanism so that the boat transfer mechanism transfers one of the boats from the second stage to the first stage, the substrate transfer mechanism then transfers the substrate(s) from the carrier to the boat held by the first stage, and the first stage then moves the boat into the processing chamber for processing.
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