Semiconductor device producing apparatus and producing method of semiconductor device
    1.
    发明授权
    Semiconductor device producing apparatus and producing method of semiconductor device 有权
    半导体装置的制造装置及半导体装置的制造方法

    公开(公告)号:US07198447B2

    公开(公告)日:2007-04-03

    申请号:US10360597

    申请日:2003-02-06

    摘要: A semiconductor device producing apparatus is disclosed. The apparatus includes a carrier-holding stage for placing a carrier; first, second and third stages each for holding first and second boats one at a time, each boat holding one or more substrates; a boat transfer mechanism for transferring the boats among the first, second and third stages; and a substrate transfer mechanism for transferring the substrate(s) from the carrier to the boat held by the first stage. A controller controls the first stage, the boat transfer mechanism and the substrate transfer mechanism so that the boat transfer mechanism transfers one of the boats from the second stage to the first stage, the substrate transfer mechanism then transfers the substrate(s) from the carrier to the boat held by the first stage, and the first stage then moves the boat into the processing chamber for processing.

    摘要翻译: 公开了一种半导体器件制造装置。 该装置包括用于放置载体的载体保持台; 第一,第二和第三阶段各自用于一次一个地保持第一和第二船,每个船保持一个或多个基底; 在第一,第二和第三阶段转运船只的船只转运机构; 以及用于将基板从载体转移到由第一级保持的船的基板传送机构。 控制器控制第一阶段,船只传送机构和基板传送机构,使得船只传送机构将其中一个船从第二阶段转移到第一阶段,然后基板传送机构将载体从载体 到第一阶段所持有的船,然后第一阶段将船移动到处理室中进行处理。

    Dual loading port semiconductor processing equipment
    2.
    发明授权
    Dual loading port semiconductor processing equipment 有权
    双加载端口半导体加工设备

    公开(公告)号:US06641350B2

    公开(公告)日:2003-11-04

    申请号:US09834913

    申请日:2001-04-16

    IPC分类号: F26B2106

    摘要: A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.

    摘要翻译: 基板处理设备包括两个荚支撑台和两个可独立操作的荚门开启器。 每个荚支撑台能够在其上放置用于在其中容纳基底的荚。 每个荚门开启器具有允许访问放置在相应的荚支撑台上的荚内的基底的装置。

    Dual loading port semiconductor processing equipment
    4.
    再颁专利
    Dual loading port semiconductor processing equipment 有权
    双加载端口半导体加工设备

    公开(公告)号:USRE43023E1

    公开(公告)日:2011-12-13

    申请号:US12724026

    申请日:2010-03-15

    IPC分类号: F26B21/06

    摘要: A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.

    摘要翻译: 基板处理设备包括两个荚支撑台和两个可独立操作的荚门开启器。 每个荚支撑台能够在其上放置用于在其中容纳基底的荚。 每个荚门开启器具有允许访问放置在相应的荚支撑台上的荚内的基底的装置。

    Substrate processing method and apparatus

    公开(公告)号:US06658321B2

    公开(公告)日:2003-12-02

    申请号:US09956820

    申请日:2001-09-21

    IPC分类号: G06F700

    CPC分类号: H01L21/67276 H01L21/68

    摘要: Substrate positioning and substrate transporting are processed in parallel, thereby reducing substrate transfer apparatus wait time and improving substrate processing throughput. A substrate transfer apparatus 1 is configured in a single unit, a plural number of wafers W prior to notch alignment is transported at one time from a substrate accommodating container to a substrate alignment apparatus 22, and the plural number of notch aligned wafers is transported from the substrate alignment apparatus 22 to a boat 21. Two stages (upper and lower) of notch alignment units 4 and 5 that configure the substrate alignment apparatus 22 operate independently, and are capable of performing notch alignment, in total, on a number of wafers to be processed that is twice the number of wafers transported at one time by the substrate transfer apparatus 1. While notch alignment is being performed in the one notch alignment unit 4, notch aligned wafers W are transported by the substrate transfer apparatus from the other notch alignment unit 5 to the boat 21, and then wafers prior to notch alignment are transported from the substrate accommodating container to the other notch alignment unit 5.

    Substrate processing apparatus
    7.
    发明授权

    公开(公告)号:US06540469B2

    公开(公告)日:2003-04-01

    申请号:US09945643

    申请日:2001-09-05

    IPC分类号: B65G4907

    摘要: A substrate processing apparatus includes a process tube for processing a plurality of substrates, two boats for accommodating the substrates, two boat elevators, a substrate transfer unit for loading and unloading the substrates into and from the boats when the boats are at the first position. In this apparatus, each boat elevator has one boat mounted thereon and each of the boat elevators carries a corresponding boat between a first position located below the process tube and two corresponding second positions. Each of the boat elevators performs loading and unloading the corresponding boat into and from the process tube at the first position. Further, in the apparatus, a center position of the process tube is disposed inside a triangle formed by connecting the substrate transfer unit and the two boat elevators.

    Heat treatment apparatus and method for processing substrates
    8.
    发明授权
    Heat treatment apparatus and method for processing substrates 有权
    热处理装置及其处理方法

    公开(公告)号:US06737613B2

    公开(公告)日:2004-05-18

    申请号:US10395179

    申请日:2003-03-25

    IPC分类号: F27B514

    摘要: A heat treatment apparatus includes a vertically disposed process tube defining a reaction chamber therein; a main heater for heating the reaction chamber, the main heater being disposed outside of the process tube; a boat for holding a plurality of wafers, the boat being loaded into and unloaded from the reaction chamber; and a boat rotating device for rotating the boat. The boat rotating device is provided with a rotatable hollow shaft assembly and a fixed shaft coaxially disposed inside the rotatable hollow shaft assembly. A sub-heater is attached to an upper end of the fixed shaft, and the boat and an insulating portion are disposed on the rotatable hollow shaft assembly.

    摘要翻译: 一种热处理设备,包括在其中限定反应室的垂直设置的处理管; 用于加热反应室的主加热器,主加热器设置在处理管的外部; 用于保持多个晶片的船,所述船被装载到所述反应室中并从所述反应室卸载; 以及用于旋转船的船旋转装置。 船用旋转装置设置有可旋转的空心轴组件和同轴地设置在可旋转中空轴组件内部的固定轴。 副加热器附接到固定轴的上端,并且船和绝缘部分设置在可旋转的中空轴组件上。