发明授权
- 专利标题： Contoured CMP pad dresser and associated methods
- 专利标题（中）： 轮廓CMP抛光修整器及相关方法
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申请号： US10954956申请日： 2004-09-29
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公开(公告)号： US07201645B2公开(公告)日： 2007-04-10
- 发明人: Chien-Min Sung
- 申请人： Chien-Min Sung
- 代理机构： Thorpe North & Western, LLP
- 主分类号： B24B21/18
- IPC分类号： B24B21/18
摘要：
CMP pad dressers with increased pad dressing work loads on the centrally located abrasive particles during dressing of a CMP pad, and methods associated therewith are disclosed and described. The increase in work load on centralized particles improves pad dressing performance and also extends the service life of the pad dresser.
公开/授权文献
- US20050095959A1 Contoured CMP pad dresser and associated methods 公开/授权日：2005-05-05
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