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US07202015B2 Positive photoresist composition and pattern making method using the same 有权
正光致抗蚀剂组合物和使用其的图案制造方法

Positive photoresist composition and pattern making method using the same
摘要：
A positive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase in a solubility in an alkali developer; and (B) as compounds capable of generating an acid upon irradiation with one of an actinic ray and a radiation, at least two compounds selected from the compounds (B1), (B2), (B3) and (B4) as defiend herein.
摘要（中）：

一种正性光致抗蚀剂组合物，其含有：（A）含有本文所述的由式（IA）表示的重复单元和本文定义的式（IB）表示的重复单元中的至少一种的树脂，并且通过 酸显示出在碱性显影剂中的溶解度的增加; 和（B）作为能够在用光化学射线和辐射之一照射时产生酸的化合物，至少两种选自化合物（B1），（B2），（B3）和（B4）的化合物，如本文所述。

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