公开(公告)号：US10126653B2

公开(公告)日：2018-11-13

申请号：US13580921

申请日：2011-02-24

申请人： Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

发明人： Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

IPC分类号： G03F7/30 ,  G03F7/004 ,  G03F7/38 ,  G03F7/075 ,  G03F7/038 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32

摘要： Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

公开(公告)号：US08603733B2

公开(公告)日：2013-12-10

申请号：US13196530

申请日：2011-08-02

申请人： Shinji Tarutani ,  Hideaki Tsubaki ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

发明人： Shinji Tarutani ,  Hideaki Tsubaki ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/32 ,  G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

摘要： A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

摘要翻译： 一种图案形成方法，包括施加抗蚀剂组合物的步骤，所述抗蚀剂组合物在负光谱显影剂中的溶解度随着光化射线或辐射的照射而降低，并且其含有具有脂环族烃结构和分散性为1.7以下并且能够增加的树脂 通过酸的作用的极性，曝光步骤和使用负色调显影剂的显影步骤; 用于该方法的抗蚀剂组合物; 并且提供了用于该方法的显影剂和冲洗溶液，由此可以形成线边缘粗糙度降低且尺寸均匀性高的图案。

公开(公告)号：US08349535B2

公开(公告)日：2013-01-08

申请号：US12895504

申请日：2010-09-30

申请人： Kana Fujii ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

发明人： Kana Fujii ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.

摘要翻译： 根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得可溶于 碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地 取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同 彼此。

公开(公告)号：US07989137B2

公开(公告)日：2011-08-02

申请号：US12238856

申请日：2008-09-26

申请人： Shuji Hirano ,  Kazuyoshi Mizutani ,  Shinichi Sugiyama ,  Jiro Yokoyama

发明人： Shuji Hirano ,  Kazuyoshi Mizutani ,  Shinichi Sugiyama ,  Jiro Yokoyama

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A resist composition includes (A) a resin including: a repeating unit capable of decomposing by the action of an acid to increase solubility in an alkali developing solution and represented by formula (I), and a repeating unit represented by formula (II); and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation: wherein A represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxyl group, a halogen atom, a cyano group, a nitro group, an acyl group, an acyloxy group, a cycloalkyl group, an aryl group, a carboxyl group, an alkyloxycarbonyl group, an alkylcarbonyloxy group, or an aralkyl group; Ra represents a group containing a group capable of decomposing by the action of an acid; Rb represents an alkylene group, a cycloalkylene group, or a group of combining these groups; Y represents a heterocyclic group; and m represents 0 or 1.

摘要翻译： 抗蚀剂组合物包括（A）树脂，其包含：能够通过酸的分解而分解的碱性显影液中的溶解度并由式（I）表示的重复单元和由式（II）表示的重复单元的重复单元; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中A表示氢原子，烷基，羟基，烷氧基，卤素原子，氰基，硝基， 酰基，酰氧基，环烷基，芳基，羧基，烷氧基羰基，烷基羰基氧基或芳烷基; Ra表示含有能够通过酸的作用分解的基团的基团; Rb表示亚烷基，亚环烷基或组合这些基团的基团; Y表示杂环基; m表示0或1。

公开(公告)号：US07645557B2

公开(公告)日：2010-01-12

申请号：US11524284

申请日：2006-09-21

申请人： Kazuyoshi Mizutani ,  Hiromi Kanda ,  Haruki Inabe

发明人： Kazuyoshi Mizutani ,  Hiromi Kanda ,  Haruki Inabe

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/114

摘要： A positive resist composition, comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin having a repeating unit containing at least one alicyclic structure, of which solubility in an alkali developer increases under an action of an acid; and (C) an alkali-soluble resin having a siloxane bond as a main chain.

摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）具有含有至少一个脂环结构的重复单元的树脂，其在碱性显影剂中的溶解度在酸的作用下增加; 和（C）具有硅氧烷键作为主链的碱溶性树脂。

公开(公告)号：US20090253070A1

公开(公告)日：2009-10-08

申请号：US12410829

申请日：2009-03-25

申请人： Kazuyoshi Mizutani ,  Toru Tsuchihashi

发明人： Kazuyoshi Mizutani ,  Toru Tsuchihashi

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/113 ,  Y10S430/114

摘要： Provided is a resist composition including a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—).

摘要翻译： 提供了含有分子量为1000以下且含有至少一个磺酰胺基（-SO 2 NH-）的化合物的抗蚀剂组合物。

公开(公告)号：US20080241749A1

公开(公告)日：2008-10-02

申请号：US12057441

申请日：2008-03-28

申请人： Kazuyoshi MIZUTANI ,  Shinichi SUGIYAMA

发明人： Kazuyoshi MIZUTANI ,  Shinichi SUGIYAMA

IPC分类号： G03F7/038 ,  G03F7/00

CPC分类号： G03F7/0392 ,  G03F7/0397

摘要： A positive resist composition, includes: (B1) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (B1) in an aqueous alkali solution, the resin (B1) containing a specific hydroxystyrene-based repeating unit and/or (meth)acrylic acid-based repeating unit as defined in the specification; (B2) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (B2) in an aqueous alkali solution, the resin (B2) containing a specific hydroxystyrene-based repeating unit and/or (meth)acrylic acid-based repeating unit as defined in the specification and containing a specific aromatic ring structure-containing repeating unit as defined in the specification; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.

摘要翻译： 正型抗蚀剂组合物包括：（B1）能够在酸的作用下分解以提高树脂（B1）在碱性水溶液中的溶解度的树脂，所述树脂（B1）含有特定的羟基苯乙烯类重复单元 和/或（甲基）丙烯酸类重复单元; （B2）能够在酸的作用下分解以增加树脂（B2）在碱性水溶液中的溶解度的树脂，所述树脂（B2）含有特定的羟基苯乙烯类重复单元和/或（甲基）丙烯酸酯 酸基重复单元，其含有本说明书中定义的特定芳环结构的重复单元; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。

公开(公告)号：US20080220370A1

公开(公告)日：2008-09-11

申请号：US12043356

申请日：2008-03-06

申请人： Kazuyoshi MIZUTANI

发明人： Kazuyoshi MIZUTANI

IPC分类号： G03F7/26 ,  G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392

摘要： A positive resist composition, includes: (A) a resin having a repeating unit represented by formula (A) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (A) in an alkali developer; and a pattern forming method uses the composition.

摘要翻译： 正型抗蚀剂组合物包括：（A）具有本说明书中定义的由式（A）表示的重复单元的树脂，其在酸的作用下分解，以增加树脂（A）在碱显影剂中的溶解度 ; 并且图案形成方法使用该组合物。

公开(公告)号：US20080081289A1

公开(公告)日：2008-04-03

申请号：US11862916

申请日：2007-09-27

申请人： Fumiyuki NISHIYAMA ,  Kazuyoshi MIZUTANI ,  Masaomi MAKINO ,  Shinichi SUGIYAMA

发明人： Fumiyuki NISHIYAMA ,  Kazuyoshi MIZUTANI ,  Masaomi MAKINO ,  Shinichi SUGIYAMA

IPC分类号： G03C1/73 ,  G03C5/00

CPC分类号： G03F7/0392 ,  G03F7/0048 ,  G03F7/0397

摘要： A resist composition, comprises: (A) a resin containing a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and (C) a solvent containing: (C1) a propylene glycol monoalkyl ether carboxylate; and (C2) at least one member selected from the group consisting of a propylene glycol monoalkyl ether, an alkyl lactate, an acetic acid ester, an alkyl alkoxypropionate, a chain ketone and a cyclic ketone: wherein AR represents a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring; Rn represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group or a substituted or unsubstituted aryl group; and A represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a halogen atom, a cyano group or a substituted or unsubstituted alkyloxycarbonyl group, and the pattern forming method uses the same.

摘要翻译： 抗蚀剂组合物包含：（A）含有式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和（C）含有：（C1）丙二醇单烷基醚羧酸酯的溶剂; 和（C2）选自丙二醇单烷基醚，乳酸烷基酯，乙酸酯，烷基丙酸酯，链酮和环酮的组中的至少一种：其中AR表示取代或未取代的苯环 或取代或未取代的萘环; Rn表示取代或未取代的烷基，取代或未取代的环烷基或取代或未取代的芳基; A表示氢原子，取代或未取代的烷基，取代或未取代的环烷基，卤素原子，氰基或取代或未取代的烷氧基羰基，图案形成方法使用。

公开(公告)号：US20070218407A1

公开(公告)日：2007-09-20

申请号：US11717645

申请日：2007-03-14

申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

IPC分类号： G03C1/00

CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。